[Semiconductor Device Characterization]

♦ Device fabrication

  - MOS devices

  - High-k capacitors (DRAM & Flash)

  - Oxide semiconductor transistors

  - OLEDs   

[Semiconductor Device Characterization]

♦ Device characterization

  - I-V and C-V method

  - Interfacial stability

  - Oxide and channel defects

  - Reliability

[Oxide semiconductor TFTs]

Japanese Journal of Applied Physics, 53, 08NG04 (2014)

[MOS and MIM high-k capacitors]

IEEE Transactions on Electron Devices, 65,  4839 (2018)

[Charge trap devices]

IEEE Electron Device Letters, 40, 1427 (2019)

[OLEDs]

Journal of Nanoscience and Nanotechnology, 18, 5908 (2018)

[MOSFETs]

IEEE Transactions on Electron Devices, 65, 3237 (2018)