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Kwang-Ho Kwon, Seung-Youl Kang, Geun-Young Yeom, Nam-Kwan Hong, and Jin Ho Lee
Department of Electronic Engineering, Hanseo University, Seosan-Si, Chung-Nam 356-820, Korea; Microelectronics Technical Laboratory, Electronics and Telecommunications Research Institute, Yusong-Gu, Taejon 305-350, Korea; Department of Materials Engineeri
Etch Characteristics of Pt Using Cl2/Ar/O2 Gas Mixtures
2000-05-05T09:42:13Z
2013-05-29T06:54:05-07:00
2013-05-29T06:54:05-07:00
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