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Hyeon-Soo Kim, Weon-Jeong Lee, Geun-Young Yeom, Jung-Hun Kim, and Ki-Woong Whang
Department of Materials Engineering, Sungkyunkwan University, Suwon 440-746, Korea Department of Electrical Engineering, Seoul National University, Seoul 151-742, Korea
Etch-Induced Physical Damage and Contamination during Highly Selective Oxide Etching Using C 4 F 8 /H 2 Helicon Wave Plasmas
1999-10-07T13:14:15Z
2013-05-29T06:14:08-07:00
2013-05-29T06:14:08-07:00
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