[2018년]Effects of tunneling dielectrics formed by CO2 and N2 O plasma-assisted oxidations on memory characteristics in p
- 정보통신소자연구실
- 조회수556
- 2020-03-11
Effects of tunneling dielectrics formed by CO2 and N2O plasma-assisted oxidations on memory characteristics in p-channel LTPS NVM devices with ONO structure